The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Apr. 26, 2018
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Bencherki Mebarki, Santa Clara, CA (US);
Xianmin Tang, San Jose, CA (US);
Sundar Ramamurthy, Fremont, CA (US);
Jerome Machillot, Brussels, BE;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28518 (2013.01); H01L 21/2855 (2013.01); H01L 21/324 (2013.01);
Abstract
Methods for forming a metal silicide film with low resistivity at low temperature are described. A metal silicide film is formed on a substrate surface and annealed at high pressure and low temperature.