The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Sep. 11, 2017
General Electric Company, Schenectady, NY (US);
Stacey Joy Kennerly, Schenectady, NY (US);
Victor Torres, Schenectady, NY (US);
David Lilienfeld, Niskayuna, NY (US);
Robert Dwayne Gossman, Clifton Park, NY (US);
Gregory Keith Dudoff, Schenectady, NY (US);
GENERAL ELECTRIC COMPANY, Schenectady, NY (US);
Abstract
A method for sputtering an aluminum layer on a surface of a semiconductor device is presented. The method includes three sputtering steps for depositing the aluminum layer, where each sputtering step includes at least one sputtering parameter that is different from a corresponding sputtering parameter of another sputtering step. The surface of the semiconductor device includes a dielectric layer having a plurality of openings formed through the dielectric layer.