The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
May. 16, 2016
Shimadzu Corporation, Kyoto-shi, Kyoto, JP;
Tomohito Nakano, Kyoto, JP;
SHIMADZU CORPORATION, Kyoto-shi, Kyoto, JP;
Abstract
A shutter moves along a surface of a partition wall provided between two spaces different in pressure, which faces the space higher in pressure, to open and close an aperture formed on the partition wall with an amount of force smaller than conventional shutters require. The shutter includes: a plate-shaped first member arranged in a manner of moving along a surface of the partition wall, which faces one of the two spaces higher in pressure, to open and close the aperture, the first member being provided, in a region which corresponds to the aperture, with a small aperture having an area smaller than the area of the aperture, and a plate-shaped second member arranged in a manner of moving along a surface of the first member, which faces the space higher in pressure, to open and close the small aperture.