The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Jun. 24, 2016
Shimadzu Corporation, Kyoto-shi, Kyoto, JP;
Tomohito Nakano, Kyoto, JP;
SHIMADZU CORPORATION, Kyoto-shi, Kyoto, JP;
Abstract
Provided is an ICP mass spectrometer which is able to effectively discharge residual water by limiting the consumption of Ar gas and a fluctuation in supply pressure of an Ar gas source at the time of an Ar gas purge for a coolant system. The ICP mass spectrometer is provided with: a device body part; a coolant systemthat supplies a coolant from a water sourceto to-be-cooled structure parts including a high-frequency power supply, a high-frequency coil, and a sample introduction part, which need to be cooled; and an Ar gas supply system. Intermediate valves V, Vare disposed on the downstream side of a main valve V, a purge gas channelhaving a purge valve V, and a meeting point G of the purge gas channel. The to-be-cooled structure parts are connected to a cooling-use pipe on the downstream side of the intermediate valves V, V. A valve control partis configured to perform intermittent purge control of repeating accumulation and discharge of the Ar gas on the upstream side of the intermediate valves V, Vby intermediately opening and closing the intermediate valves V, Vwhen the Ar gas is being sent.