The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2019

Filed:

Nov. 10, 2016
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Tomas Eriksson, Uppsala, SE;

Martin Pärnaste, Uppsala, SE;

Jonas Norling, Uppsala, SE;

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21G 1/10 (2006.01); G21G 1/00 (2006.01); H05H 6/00 (2006.01);
U.S. Cl.
CPC ...
G21G 1/10 (2013.01); G21G 1/001 (2013.01); H05H 6/00 (2013.01); G21G 2001/0015 (2013.01); G21G 2001/0021 (2013.01);
Abstract

Target assembly for an isotope production system. The target assembly includes a target body having a production chamber and a beam cavity that is adjacent to the production chamber. The production chamber is configured to hold a target material. The beam cavity opens to an exterior of the target body and is configured to receive a particle beam that is incident on the production chamber. The target assembly also includes a target sheet positioned to separate the beam cavity and the production chamber. The target sheet has a side that is exposed to the production chamber such that the target sheet is in contact with the target material during isotope production. The target sheet includes graphene.


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