The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2019

Filed:

Jul. 11, 2017
Applicant:

Here Global B.v., Eindhoven, NL;

Inventors:

Guangli Wu, San Mateo, CA (US);

Jeffrey Adachi, El Cerrito, CA (US);

Antonio Haro, Walnut Creek, CA (US);

Assignee:

HERE Global B.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/49 (2017.01); G06T 15/04 (2011.01); G06T 19/20 (2011.01); G06T 7/90 (2017.01); G06T 7/60 (2017.01);
U.S. Cl.
CPC ...
G06T 15/04 (2013.01); G06T 7/49 (2017.01); G06T 19/20 (2013.01); G06T 7/60 (2013.01); G06T 7/90 (2017.01); G06T 2207/30184 (2013.01);
Abstract

An approach involves receiving pixel-level labeling data for an image depicting at least a portion of a building facade. The pixel-level labeling data labels each of a plurality of pixels of the image as either window pixels or non-window pixels. The approach further involves generating a window pattern based on window size data, window spacing data, or a combination thereof extracted from the pixel-level labeling data. The approach further involves computing a confidence score for the window pattern based on at least one observed value of at least one characteristic of the window pattern or a deviation of the observed value from at least one expected value, and generating an abstract texture based on the window pattern, the confidence score, and/or other probabilistic metrics.


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