The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2019

Filed:

Feb. 27, 2017
Applicants:

Alejandro Rodriguez, Princeton, NJ (US);

Zin Lin, Somerville, MA (US);

Steven G. Johnson, Arlington, MA (US);

Marko Loncar, Belmont, MA (US);

Xiangdong Liang, Arlington, MA (US);

Inventors:

Alejandro Rodriguez, Princeton, NJ (US);

Zin Lin, Somerville, MA (US);

Steven G. Johnson, Arlington, MA (US);

Marko Loncar, Belmont, MA (US);

Xiangdong Liang, Arlington, MA (US);

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/35 (2006.01); G02F 1/355 (2006.01); G02F 1/37 (2006.01);
U.S. Cl.
CPC ...
G02F 1/3501 (2013.01); G02F 1/353 (2013.01); G02F 1/3551 (2013.01); G02F 1/3556 (2013.01); G02F 1/37 (2013.01); G02F 2001/3503 (2013.01); G02F 2001/354 (2013.01);
Abstract

A fully confined dual frequency optical resonator configured for optical coupling to light having a first frequency ω. The dual frequency optical resonator includes a plurality of alternating layer pairs configured in a grating configuration, each layer pair having a first layer formed of a first material and a second layer formed of a second material, the first material and second material being different materials. Each layer having a thickness different than a thickness of an adjacent layer to provide thereby aperiodic layer pairs, the thicknesses of adjacent layers being selected to create, via wave interference with each layer, optical resonances at the first frequency ωand a second frequency ωwhich is a harmonic of ω, and to ensure a maximum spatial overlap between confined modes over the materials such that an overall quality factor Q of at least 1000 is achieved.


Find Patent Forward Citations

Loading…