The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Nov. 09, 2017
Nalux Co., Ltd., Osaka-shi, Osaka, JP;
Kazuya Yamamoto, Osaka, JP;
Takeshi Yamamoto, Osaka, JP;
NALUX CO., LTD., Osaka-shi, Osaka, JP;
Abstract
A method for manufacturing a mold or an optical element provided with a fine surface roughness for anti-reflection or for diffusing, may include placing a substrate or a film made of a semiconductor or a metal into a reacting etching apparatus, introducing a mixed gas of sulfur hexafluoride and oxygen into the etching apparatus with the substrate or the film, tuning the mixed gas into plasma such that oxides are made to be scattered on a surface of the substrate or the film, and etching the surface of the substrate of the film by the sulfur hexafluoride while the oxides function as an etching mask to form the fine surface roughness on the surface of the substrate or the film. Further, etching conditions may be determined such that the pitch of the fine surface roughness is made from 3 to 18 micrometers.