The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2019

Filed:

Feb. 10, 2011
Applicants:

Kazuhiko Fukazawa, Kamakura, JP;

Yoshihiko Fujimori, Yokohama, JP;

Inventors:

Kazuhiko Fukazawa, Kamakura, JP;

Yoshihiko Fujimori, Yokohama, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/95 (2006.01); G03F 9/00 (2006.01); G03F 7/20 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G03F 7/70641 (2013.01); G03F 9/7026 (2013.01); H01L 22/12 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A surface inspection apparatus () has a stage () for supporting a wafer () on which predetermined patterns have been formed by exposure using an exposure device (); an illumination system () for irradiating an illuminating light on the surface of the wafer () supported by the stage (); an imaging device () for detecting light from the surface of the wafer () on which illuminating light has been irradiated, and outputting a detection signal; and an image processing unit () for determining the focus state during exposure, on the basis of the detection signal sent from the imaging device ().


Find Patent Forward Citations

Loading…