The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2019

Filed:

Aug. 29, 2017
Applicant:

Caterpillar Inc., Peoria, IL (US);

Inventors:

Yong Yi, Dunlap, IL (US);

Shuhai Hou, Peoria, IL (US);

Hongsheng Sun, Dunlap, IL (US);

Assignee:

Caterpillar Inc., Deerfield, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F01N 3/20 (2006.01); B01D 53/94 (2006.01); G01B 11/06 (2006.01);
U.S. Cl.
CPC ...
F01N 3/2026 (2013.01); B01D 53/9431 (2013.01); B01D 53/9495 (2013.01); F01N 3/208 (2013.01); G01B 11/0625 (2013.01); B01D 2258/012 (2013.01);
Abstract

A method and system for modeling growth of reductant deposits for an aftertreatment system on a real time basis using input including exhaust gas temperature, exhaust gas flow rate, and reductant dosing rate. The growth of the reductant deposits are affected by a rate at which reductant accumulates and decomposes from a surface of the aftertreatment system. Thus, the method and system disclosed determines a net reductant deposit growth rate value based on a reductant deposit accumulation rate value and a reductant deposit decomposition rate value. Further, the method and system disclosed determines a reductant mass deposit value based on the net reductant deposit growth rate value. The reductant mass deposit value determined by the method and system may then be used to control a regeneration strategy of the aftertreatment system to eliminate the reductant deposits from the aftertreatment system.


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