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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10351958 B1

PDFFull Text
Date of Patent:
Jul. 16, 2019

Filed:

Jun. 22, 2015

Systems and methods for electroless plating of thin gold films directly onto silicon nitride and into pores in silicon nitride

Applicant:

Rhode Island Board of Education, State of Rhode Island and Providence Plantations, Providence, RI (US);

Inventors:

Jason Rodger Dwyer, Providence, RI (US);

Julie C. Whelan, Charlestown, RI (US);

Y. M. Nuwan D. Y. Bandara, Kingston, RI (US);

Buddini I. Karawdeniya, Kingston, RI (US);

Assignee:

Council On Postsecondary Education, Warwick, RI (US);

Attorneys:

Milstein Zhang & Wu, LLC

Duan Wu, Esq.

Primary Examiner:

Shamim Ahmed

Int. Cl.
CPC ...
C23C 18/16 (2006.01); C23C 18/18 (2006.01); C23C 18/42 (2006.01);
U.S. Cl.
CPC ...
C23C 18/42 (2013.01); C23C 18/1608 (2013.01); C23C 18/1612 (2013.01); C23C 18/1633 (2013.01); C23C 18/18 (2013.01); C23C 18/1851 (2013.01); C23C 18/1893 (2013.01); C23C 18/1844 (2013.01);
Abstract

A method is disclosed for electroless plating of thin metal film directly onto a substrate. The method includes the steps of: cleaning the substrate to remove organic material; etching a surface of the substrate to remove an oxygen-containing surface layer; soaking and rinsing the substrate in a plurality of baths following etching; and electroless plating the metal onto the substrate.

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Dwyer, Jason. (2019). Systems and methods for electroless plating of thin gold films directly onto silicon nitride and into pores in silicon nitride (U.S. Patent No. 10351958). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10351958

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