The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Dec. 17, 2013
Rolic Ag, Zug, CH;
Martin Stalder, Oberwil, CH;
ROLIC AG, Zug, CH;
Abstract
The present invention relates to an element comprising a surface area with a specific, optically effective surface relief microstructure (). The surface relief microstructure has a surface modulation of top regions () and bottom regions (), wherein in a first lateral direction of the surface area there is in average at least one transition from a top to a bottom region or vice versa within every 20 micrometer, and in a second lateral direction of the mask, which is perpendicular to the first direction, there is in average at least one transition from a first to a second zone or vice versa within every 200 micrometer. In the microstructure, (i) in the first direction the lateral arrangement of the transitions is non-periodic, and (ii) the top regions substantially lie in the same top relief plateau () and the bottom regions substantially lie in the same bottom relief plateau ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile