The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2019
Filed:
Feb. 21, 2017
Applicant:
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Inventors:
Brent S. Krusor, Fremont, CA (US);
Ping Mei, San Jose, CA (US);
Assignee:
PALO ALTO RESEARCH CENTER INCORPORATED, Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/10 (2006.01); H05K 3/12 (2006.01); B05C 1/08 (2006.01); B43K 7/00 (2006.01); B05C 1/02 (2006.01);
U.S. Cl.
CPC ...
H05K 3/1275 (2013.01); B05C 1/027 (2013.01); B05C 1/08 (2013.01); B05C 1/0813 (2013.01); B05C 11/1021 (2013.01); B43K 7/00 (2013.01);
Abstract
A material deposition system and method is disclosed for depositing material onto raised features on a surface of a substrate. The material deposition system and method are a contact deposition or printing system and method, which employs biased rollerball to deposit the material as it travels along the substrate and over the raised features.