The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2019

Filed:

Nov. 01, 2017
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventor:

William Michael Stone, San Diego, CA (US);

Assignee:

QUALCOMM Incorporated, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/12 (2006.01); H01L 21/4763 (2006.01); H01L 23/00 (2006.01); H01L 21/56 (2006.01); H01L 23/522 (2006.01); H01L 23/528 (2006.01); H01L 21/768 (2006.01); H01L 23/31 (2006.01); H01L 23/48 (2006.01); H01L 23/498 (2006.01); H01L 25/00 (2006.01); H01L 25/065 (2006.01);
U.S. Cl.
CPC ...
H01L 23/562 (2013.01); H01L 21/563 (2013.01); H01L 21/76802 (2013.01); H01L 21/76877 (2013.01); H01L 23/3171 (2013.01); H01L 23/481 (2013.01); H01L 23/49816 (2013.01); H01L 23/5226 (2013.01); H01L 23/5283 (2013.01); H01L 24/11 (2013.01); H01L 24/13 (2013.01); H01L 24/16 (2013.01); H01L 25/0657 (2013.01); H01L 25/50 (2013.01); H01L 2224/13025 (2013.01); H01L 2224/13101 (2013.01); H01L 2224/16145 (2013.01); H01L 2224/16225 (2013.01); H01L 2224/16227 (2013.01); H01L 2225/06513 (2013.01); H01L 2225/06548 (2013.01); H01L 2225/06568 (2013.01); H01L 2924/14 (2013.01); H01L 2924/15311 (2013.01); H01L 2924/35121 (2013.01);
Abstract

An integrated circuit (IC) device includes a device layer and a passivation layer, where the passivation layer has vias formed in an interior region of the passivation layer that are larger than vias formed in a perimeter region of the passivation layer. As such, a varying diameter via layer is provided. The interior region vias may be configured to reduce a risk of damage to the IC device due to tensile stress, with sizes or shapes selected based on the amount of tensile stress expected to occur during subsequent use of the IC device. The perimeter region vias may be configured to reduce a risk of damage to the IC device due to sheer stress, with sizes or shapes selected based on the amount of sheer stress expected to occur during subsequent assembly or use of the IC device. Method and apparatus examples are described for use with flip-chip dies.


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