The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2019

Filed:

Sep. 12, 2016
Applicant:

Vanguard International Semiconductor Corporation, Hsinchu, TW;

Inventors:

Hsiung-Shih Chang, Taichung, TW;

Jui-Chun Chang, Hsinchu, TW;

Li-Che Chen, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/74 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76229 (2013.01); H01L 21/743 (2013.01);
Abstract

A trench isolation structure is provided. The trench isolation structure includes a substrate. A polygonal trench is disposed in the substrate. An insulating material is disposed in the polygonal trench, and a polygon top-side contact structure is disposed in the polygonal trench and surrounded by the insulating material. The polygon top-side contact structure has the same shape as the polygonal trench from a top view. A method for forming the trench isolation structure is also provided.


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