The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2019

Filed:

Jul. 19, 2013
Applicant:

Brigham Young University, Provo, UT (US);

Inventors:

Walter Edward Red, Provo, UT (US);

Charles Gregory Jensen, Provo, UT (US);

Prasad Weerakoon, Provo, UT (US);

Jingsi (James) Wu, Norcross, GA (US);

Karl Merkley, Lindon, UT (US);

Jared Briggs, Provo, UT (US);

Assignee:

Brigham Young University, Provo, UT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5018 (2013.01);
Abstract

A method for collaborative finite analysis may include obtaining an electronic model of an engineering object, assigning users one or more geometries for pre-analysis editing to provide assigned geometries for each user, and enabling each user to conduct pre-analysis editing of their assigned geometries concurrent with other users. The method may also include conducting finite analysis on the assigned geometries of a first user concurrent with conducting finite analysis on the assigned geometries of a second user. Examples of pre-analysis editing include removing features that are secondary to analysis, applying a material definition to a geometry, pre-meshing a geometry, initiating automated meshing of a geometry, validating automated meshing of a geometry, editing a mesh for a geometry, manually meshing a geometry, defining one or more loads associated with a geometry, and defining one or more boundary conditions for a geometry. A corresponding system and apparatus are also disclosed herein.


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