The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2019
Filed:
Oct. 26, 2017
Applicant:
National Cheng Kung University, Tainan, TW;
Inventors:
Chun-Fang Chen, Hsinchu County, TW;
Hao Tieng, Tainan, TW;
Fan-Tien Cheng, Tainan, TW;
Haw-Ching Yang, Tainan, TW;
Assignee:
NATIONAL CHENG KUNG UNIVERSITY, Tainan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 13/04 (2006.01); G05B 19/418 (2006.01); H01L 21/66 (2006.01); G05B 19/042 (2006.01);
U.S. Cl.
CPC ...
G05B 19/41875 (2013.01); G05B 19/0426 (2013.01); G05B 19/41865 (2013.01); H01L 22/20 (2013.01); G05B 13/04 (2013.01); G05B 2219/32075 (2013.01); G05B 2219/35346 (2013.01); Y02P 90/02 (2015.11); Y02P 90/30 (2015.11);
Abstract
A product quality prediction method for mass customization is provided. When a production system has a status change, data of sets of process parameters and actual measurement values of workpiece samples processed before the status change occurs, and data of sets of process parameters and actual measurement values of few workpiece samples processed after the status change occurs are used for build or retrain a prediction model, thereby predicting a metrology value of a next workpiece.