The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2019

Filed:

Sep. 02, 2017
Applicant:

Richard S. Belliveau, Austin, TX (US);

Inventor:

Richard S. Belliveau, Austin, TX (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 5/00 (2018.01); F21V 3/06 (2018.01); F21V 11/00 (2015.01); F21V 13/00 (2006.01); F21V 14/08 (2006.01); F21S 10/00 (2006.01); F21K 9/64 (2016.01); F21V 17/02 (2006.01); F21V 29/70 (2015.01); F21V 29/89 (2015.01); F21V 8/00 (2006.01); F21V 13/02 (2006.01); F21Y 115/10 (2016.01); F21W 131/406 (2006.01); F21V 14/06 (2006.01); F21V 19/00 (2006.01); F21V 19/02 (2006.01);
U.S. Cl.
CPC ...
F21V 5/007 (2013.01); F21K 9/64 (2016.08); F21S 10/007 (2013.01); F21V 3/061 (2018.02); F21V 3/062 (2018.02); F21V 11/00 (2013.01); F21V 13/00 (2013.01); F21V 13/02 (2013.01); F21V 14/08 (2013.01); F21V 17/02 (2013.01); F21V 29/70 (2015.01); F21V 29/89 (2015.01); G02B 6/0008 (2013.01); G02B 6/0096 (2013.01); F21V 14/06 (2013.01); F21V 19/0055 (2013.01); F21V 19/02 (2013.01); F21W 2131/406 (2013.01); F21Y 2115/10 (2016.08);
Abstract

A theater light projector including a housing, a plurality of light sources, a plurality of lenses, a light exiting output aperture, and a central integrating mask. The light exiting output aperture has a center. The plurality of light sources are arranged around a central axis. The plurality of light sources project light though the light exiting output aperture. The center of the light exiting output aperture is substantially void of projected light projected by the plurality of light sources. The central integrating mask is located in the center of the light exiting aperture and partially intersects a portion of the projected light from each of the plurality of light sources.


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