The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2019
Filed:
Jul. 22, 2015
Basf SE, Ludwigshafen, DE;
Julia Strautmann, Bad Laer, DE;
Rocco Paciello, Bad Duerkheim, DE;
Thomas Schaub, Neustadt, DE;
Felix Eickemeyer, Heidelberg, DE;
Daniel Loeffler, Birkenheide, DE;
Hagen Wilmer, Ludwigshafen, DE;
Udo Radius, Kleinrinderfeld, DE;
Johannes Berthel, Wuerzburg, DE;
Florian Hering, Wuerzburg, DE;
BASF SE, Ludwigshafen, DE;
Abstract
The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In detail the present invention relates a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state (Fig.) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein Rand Rare independent of each other an alkyl group, an aryl group or a trialkylsilyl group, R, R, Rand Rare independent of each other hydrogen, an alkyl group, an aryl group or a trialkylsilyl group, n is an integer from 1 to 3, M is Ni or Co, X is a ligand which coordinates M, and m is an integer from 0 to 4.