The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2019
Filed:
Jul. 07, 2014
Applicant:
H.e.f., Andrezieux-Boutheon, FR;
Inventor:
Christophe Heau, Saint-Etienne, FR;
Assignee:
H.E.F., Andrieux-Boutheon, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/06 (2006.01); C23C 16/26 (2006.01); C23C 28/04 (2006.01); C10M 103/02 (2006.01); C23C 14/02 (2006.01); C23C 14/32 (2006.01); C23C 16/02 (2006.01); C10M 103/04 (2006.01); C10M 103/06 (2006.01);
U.S. Cl.
CPC ...
C10M 103/02 (2013.01); C10M 103/04 (2013.01); C10M 103/06 (2013.01); C23C 14/024 (2013.01); C23C 14/0605 (2013.01); C23C 14/325 (2013.01); C23C 16/0272 (2013.01); C23C 16/26 (2013.01);
Abstract
A mechanical part provided with an amorphous carbon coating (with at least 70 wt. % of carbon not including hydrogen) and used to cooperate slidingly with an antagonistic part having a surface hardness which is a maximum of two thirds of that of the coating. The mechanical part is such that the coating has a roughness Ra which, measured by profilometry, is equal to a maximum of 0.050 microns and, measured by atomic force microscopy, a micro-roughness which is equal to a minimum of 0.004 microns and a maximum of 0.009 microns. This minimizes the wear of the less hard antagonistic part and that of the coating.