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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10344124 B1

PDFFull Text
Date of Patent:
Jul. 09, 2019

Filed:

Feb. 26, 2016

Polyether-based polymer composition

Applicant:

Zeon Corporation, Tokyo, JP;

Inventors:

The Ban Hoang, Tokyo, JP;

Keisuke Ohta, Tokyo, JP;

Shigetaka Hayano, Tokyo, JP;

Yasuo Tsunogae, Tokyo, JP;

Assignee:

ZEON CORPORATION, Tokyo, JP;

Attorney:

Westerman, Hattori, Daniels & Adrian, LLP

Primary Examiner:

Shane Fang

Int. Cl.
CPC ...
C08K 3/04 (2006.01); C01B 32/05 (2017.01); C08G 65/08 (2006.01); C08L 71/02 (2006.01); G01N 30/00 (2006.01); G01R 33/46 (2006.01);
U.S. Cl.
CPC ...
C08G 65/08 (2013.01); C01B 32/05 (2017.08); C08K 3/041 (2017.05); C08K 3/042 (2017.05); C08L 71/02 (2013.01); C08K 2201/011 (2013.01); G01N 2030/486 (2013.01); G01R 33/46 (2013.01);
Abstract

The present invention is a polyether-based polymer composition includes: a polyether-based polymer including an oxirane monomer unit and having one cationic group substantially only at one terminal of a polymer chain, and a nanocarbon material. The polyether-based polymer composition of the present invention can be suitably used, for example, as a bucky gel or as a master batch for preparing a nanocarbon material aqueous dispersion in which a nanocarbon material is favorably dispersed.

Find Patent Forward Citations

Hoang, The. (2019). Polyether-based polymer composition (U.S. Patent No. 10344124). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10344124

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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