The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Feb. 23, 2015
Applicant:
Northeastern University, Boston, MA (US);
Inventors:
Yun Fu, Wellesley, MA (US);
Shuyang Wang, Malden, MA (US);
Assignee:
Northeastern University, Boston, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 11/00 (2006.01); G06T 11/60 (2006.01); G06K 9/00 (2006.01); G06T 3/00 (2006.01); G06K 9/66 (2006.01);
U.S. Cl.
CPC ...
G06T 11/60 (2013.01); G06K 9/00268 (2013.01); G06K 9/00671 (2013.01); G06T 3/0093 (2013.01); G06T 11/00 (2013.01); G06K 9/66 (2013.01);
Abstract
A system and method are provided to detect, analyze and digitally remove makeup from an image of a face. An autoencoder-based framework is provided to extract attractiveness-aware features to perform an assessment of facial beauty.
Fu, Yun. (2019). System for beauty, cosmetic, and fashion analysis (U.S. Patent No. 10339685). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10339685
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile