The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Oct. 29, 2014
Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno, 's-Gravenhage, NL;
Rob Jacob Hendriks, 's-Gravenhage, NL;
Gari Arutinov, 's-Gravenhage, NL;
Edsger Constant Pieter Smits, 's-Gravenhage, NL;
Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO, 's-Gravenhage, NL;
Abstract
The present disclosure concerns a method and system for providing a patterned structure () on an acceptor substrate). The method comprises providing a donor substrate () arranged between a light source () and an acceptor substrate (). A mask () is arranged between the light source () and the donor substrate (). The mask () comprises a mask pattern () for patterning light (). The patterned light () impinging the donor substrate () causes the donor material () to be released from the donor substrate () and transfer to the acceptor substrate () to form the patterned structure () thereon. The patterned light () is divided by the mask pattern () into a plurality of separate homogeneously sized beams () simultaneously impinging the donor substrate () for causing the donor material () to be released from the donor substrate () in the form of separate homogeneously sized droplets ().