The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Feb. 01, 2017
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Karlton Powell, Lake Stevens, WA (US);
John Lutian, Bellevue, WA (US);
MICROSOFT TECHNOLOGY LICENSING, LLC, Redmond, WA (US);
Abstract
Tooling and optic elements for a retro-imaging system may be formed on order near atomic level of accuracy by making use of either etching or growth techniques of a cubic crystal lattice, such as silicon. The elements may be formed directly using selective etching or epitaxial growth by coating and clear resin lamination, or replicated to avoid shrinkage and curvature by use of low shrinkage resins or double-fill molding techniques. Through the use of these highly accurate reflection/diffraction elements, floating images may be formed with relatively high resolution in retro-reflective imaging systems, for example.