The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Feb. 15, 2018
Applicant:
Radom Corporation, West Allis, WI (US);
Inventors:
Jovan Jevtic, West Allis, WI (US);
Ashok Menon, Shorewood, WI (US);
Velibor Pikelja, Milwaukee, WI (US);
Assignee:
Radom Corporation, West Allis, WI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/73 (2006.01); H01J 37/32 (2006.01); G01J 3/02 (2006.01); G01J 3/443 (2006.01); H01J 37/244 (2006.01); H01J 49/04 (2006.01); H01J 49/10 (2006.01);
U.S. Cl.
CPC ...
G01N 21/73 (2013.01); G01J 3/0208 (2013.01); G01J 3/443 (2013.01); H01J 37/244 (2013.01); H01J 37/32201 (2013.01); H01J 37/32247 (2013.01); H01J 37/32449 (2013.01); H01J 49/0404 (2013.01); H01J 49/105 (2013.01); G01N 2201/0221 (2013.01);
Abstract
A plasma unit for a mass spectroscopy machine generates plasma using a microwave coupled dielectric ring held within a microwave cavity employing part of the mass spectrometer structure to define the microwave cavity, thereby permitting improved proximity of the plasma and plasma ionized sample material to the mass spectrometer aperture.