The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Dec. 12, 2016
Tosoh Corporation, Shunan-shi, Yamaguchi, JP;
Sagami Chemical Research Institute, Ayase-shi, Kanagawa, JP;
Naoyuki Koiso, Ayase, JP;
Yuki Yamamoto, Ayase, JP;
Hiroyuki Oike, Ayase, JP;
Teppei Hayakawa, Ayase, JP;
Taishi Furukawa, Ayase, JP;
Ken-ichi Tada, Ayase, JP;
SAGAMI CHEMICAL RESEARCH INSTITUTE, Ayase-shi, Kanagawa, JP;
Abstract
Provided is a cobalt complex which is useful for the production of a cobalt-containing thin film under conditions where no oxidizing gas is used. A cobalt complex represented by general formula (1) (wherein Rrepresents a silyloxy group represented by general formula (2) (wherein R, Rand Rindependently represent an alkyl group having 1 to 6 carbon atoms); Rrepresents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a silyloxy group represented by general formula (2); R, Rand Rindependently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and L represents a diene having 4 to 10 carbon atoms) is used.