The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2019

Filed:

Apr. 01, 2016
Applicant:

Wacker Chemie Ag, Munich, DE;

Inventors:

Michael Fricke, Burghausen, DE;

Martin Brixel, Kirchdorf, DE;

Robert Enggruber, Burghausen, DE;

Rainer Hauswirth, Kirchdorf, DE;

Assignee:

WACKER CHEMIE AG, Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B07B 4/08 (2006.01); B07B 11/04 (2006.01); C01B 33/037 (2006.01); B07B 11/06 (2006.01); B07B 13/16 (2006.01);
U.S. Cl.
CPC ...
B07B 4/08 (2013.01); B07B 11/04 (2013.01); B07B 11/06 (2013.01); B07B 13/16 (2013.01); C01B 33/037 (2013.01);
Abstract

Granular polysilicon is fed into a screening plant, divided into two or more fractions by means of one or more screen surfaces, and thereby classified and dedusted wherein a throwing motion of the granular polysilicon in the screening plant removes adhering dust particles from the granular polysilicon, the removed dust particles are taken off from the screening plant by means of a gas flow supplied to the screening plant, and the screening plant is of gas-tight design and supply and takeoff of the gas flow are effected such that the screening plant is at a positive pressure compared to the surroundings.


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