The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2019

Filed:

Dec. 01, 2017
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Sunki Min, Seoul, KR;

Songe Kim, Seoul, KR;

Koungmin Ryu, Hwaseong-si, KR;

Je-Min Yoo, Suwon-si, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 21/762 (2006.01); H01L 27/092 (2006.01); H01L 29/423 (2006.01); H01L 29/786 (2006.01); H01L 21/8238 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76229 (2013.01); H01L 21/82385 (2013.01); H01L 21/823821 (2013.01); H01L 21/823878 (2013.01); H01L 27/092 (2013.01); H01L 27/0924 (2013.01); H01L 29/0649 (2013.01); H01L 29/0673 (2013.01); H01L 29/42392 (2013.01); H01L 29/7848 (2013.01); H01L 29/78696 (2013.01);
Abstract

A semiconductor device includes a substrate having a first active pattern and a second active pattern, the first active pattern including a first recess region dividing an upper portion thereof into a first portion and a second portion, the second active pattern including a second recess region dividing an upper portion thereof into a first portion and a second portion, a first insulating pattern covering an inner sidewall of the first recess region, and a second insulating pattern covering an inner sidewall of the second recess region. The first insulating pattern and the second insulating pattern include the same insulating material, and a volume fraction of the first insulating pattern with respect to a volume of the first recess region is smaller than a volume fraction of the second insulating pattern with respect to a volume of the second recess region.


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