The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2019

Filed:

Oct. 08, 2015
Applicant:

The Board of Trustees of the University of Illinois, Urbana, IL (US);

Inventors:

David N. Ruzic, Pesotum, IL (US);

Ivan A. Shchelkanov, Champaign, IL (US);

Priya Raman, Champaign, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01J 37/345 (2013.01); C23C 14/35 (2013.01); H01J 37/3408 (2013.01); H01J 37/3452 (2013.01); H01J 37/3467 (2013.01);
Abstract

A magnet assembly for use in high power pulsed magnetron sputtering comprises a configuration of magnets having a magnetic field topology comprising magnetic field components B, Band B. A tangential magnetic field Bdistribution on an x-y plane above the configuration of magnets comprising an outer continuous ring and one or more inner continuous rings contained in the outer continuous ring. A total magnetic field Bdistribution on an x-z plane intersecting the configuration of magnets comprises an outer closed loop and one or more inner closed loops contained in the outer closed loop, where, as a function of x, a tangential magnetic field Balternates between (a) high field values greater than 200 G and high gradients in the z-direction of at least 1000 G/in, and (b) low field values of less than 50 G and low gradients in the z-direction of at most 250 G/in.


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