The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2019
Filed:
Aug. 31, 2016
Harbin Institute of Technology, Harbin, CN;
HARBIN INSTITUTE OF TECHNOLOGY, Harbin, CN;
Abstract
A dynamic-magnetic steel magnetic levitation double-workpiece-stage vector arc switching method and apparatus based on wireless energy transmission, falling within the semiconductor manufacturing equipment technology. The apparatus comprises a support frame (), a balance mass block (), magnetic levitation workpiece stages (), a workpiece stage measurement apparatus, wireless energy transmission apparatuses () and a wireless energy receiving apparatus (), wherein the two workpiece stages work between a measurement site () and an exposure site (); a laser interferometer () is used to measure the positions of the workpiece stages; the wireless energy transmission apparatuses () are used to provide energy for a sensor () in a micro-drive stage; the workpiece stages are driven using a magnetic levitation planar electrical motor; and during a double-workpiece-stage switching process, the planar electrical motor is used to drive the two workpiece stages so as to achieve single-beat arc quick switching. By using the method and apparatus, the problem that an existing stage switching scheme has many beats, a long track, many start-stop links and a long time for stabilization is solved, thereby reducing the stage switching links, shortening the stage switching time, and improving the productivity of a lithography machine.