The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2019

Filed:

Aug. 08, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Kunihiko Asada, Utsunomiya, JP;

Tsuyoshi Arai, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 70/78 (2006.01); H01L 21/027 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01);
Abstract

The present invention provides an imprint apparatus including a chamber configured to define a first space including a processing unit which includes a discharge unit configured to discharge an imprint material onto a substrate and is configured to perform an imprint process of forming a pattern of the imprint material on the substrate by using a mold, and an enclosure configured to define a second space including a tank configured to store the imprint material supplied to the discharge unit, wherein the tank has a first opening open to the second space, and the enclosure has a supply port configured to supply, to the second space via the first opening, a gas cleaner than a gas supplied to the first space.


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