The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2019

Filed:

Apr. 24, 2017
Applicant:

Innovative Advanced Materials, Inc., Hampton, GA (US);

Inventor:

William Alan Doolittle, Hampton, GA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C30B 23/06 (2006.01); C23C 14/24 (2006.01); C23C 14/28 (2006.01); C30B 23/00 (2006.01); H01J 37/32 (2006.01); C23C 14/26 (2006.01);
U.S. Cl.
CPC ...
C30B 23/066 (2013.01); C23C 14/243 (2013.01); C23C 14/246 (2013.01); C23C 14/26 (2013.01); C23C 14/28 (2013.01); C30B 23/005 (2013.01); H01J 37/3244 (2013.01); H01J 37/32082 (2013.01); H01J 37/32889 (2013.01); H01J 2237/332 (2013.01);
Abstract

An effusion cell includes a crucible for containing material to be evaporated or sublimated, a delivery tube configured to deliver evaporated or sublimated material originating from the crucible into a chamber, a supply tube extending from the crucible, the supply tube located and configured to trap condensate originating from the evaporated or sublimated material and to deliver the condensate back to the crucible, and at least one heating element located and configured to heat material in the crucible so as to cause evaporation or sublimation of the material and flow of the evaporated or sublimated material through the delivery tube and out from the effusion cell. The effusion cell is configured such that the crucible can be filled with the material to be evaporated or sublimated without removing the effusion cell from the process vacuum chamber. Semiconductor substrate processing systems may include such effusion cells.


Find Patent Forward Citations

Loading…