The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2019
Filed:
Jan. 05, 2016
Boe Technology Group Co., Ltd., Beijing, CN;
Hefei Boe Optoelectronics Technology Co., Ltd., Hefei, Anhui, CN;
Rui Zhang, Beijing, CN;
Duanming Li, Beijing, CN;
Kuohua Liao, Beijing, CN;
Beum Ku Park, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Hefei, Anhui, CN;
Abstract
A vapor deposition apparatus, including: a reaction device having a reaction chamber; a first gas duct connected to the reaction chamber and configured to direct a process gas into the reaction chamber; a gas ionization device connected to the reaction device and configured to ionize a cleaning gas; and a second gas duct connected to the gas ionization device and configured to direct the cleaning gas into the gas ionization device; a common gas duct; and a three-way control mechanism. An end of the common gas duct is connected to the reaction chamber and the other end of the common gas duct is connected to a first gas port of the three-way control mechanism; the first gas duct and the gas ionization device are connected to a second gas port and a third gas port of the three-way control mechanism, respectively.