The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2019
Filed:
Jun. 19, 2015
Osaka University, Suita-shi, JP;
Akira Harada, Suita, JP;
Yoshinori Takashima, Suita, JP;
Yuichiro Kobayashi, Suita, JP;
Masaki Nakahata, Suita, JP;
Shoko Mori, Suita, JP;
Osaka University, Suita-shi, JP;
Abstract
Provided is a self-restoring macromolecular material that not only has excellent stress relaxation but that can also be easily restored to its original state, even when damaged or severed. Also provided is a method for producing the self-restoring macromolecular material. The self-restoring macromolecular material contains a crosslinked structure that is formed by crosslinking a polymer containing at least a polyrotaxane molecule. The polyrotaxane molecule is formed so as to include a cyclic moleculeand a linear molecule that passes through an openingof the cyclic molecule. The crosslinked structureis crosslinked via a reversible bond between the cyclic molecule of the polyrotaxane molecule and a polymer molecule other than the polyrotaxane molecule.