The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2019
Filed:
May. 31, 2016
Applicant:
Sicpa Holding SA, Prilly, CH;
Inventors:
Evgeny Loginov, Renens, CH;
Mathieu Schmid, Lausanne, CH;
Claude-Alain Despland, Prilly, CH;
Pierre Degott, Crissier, CH;
Assignee:
SICPA HOLDING SA, Prilly, CH;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B42D 25/369 (2014.01); B41M 3/14 (2006.01); G03F 7/00 (2006.01); G03F 7/105 (2006.01); G03F 7/20 (2006.01); G07D 7/00 (2016.01); B42D 25/29 (2014.01); B42D 25/364 (2014.01); B42D 25/387 (2014.01); B42D 25/415 (2014.01); G03F 7/031 (2006.01); B42D 25/42 (2014.01); H01F 41/16 (2006.01); B42D 25/324 (2014.01); B42D 25/425 (2014.01); G06Q 30/00 (2012.01);
U.S. Cl.
CPC ...
B42D 25/369 (2014.10); B41M 3/148 (2013.01); B42D 25/29 (2014.10); B42D 25/364 (2014.10); B42D 25/387 (2014.10); B42D 25/415 (2014.10); B42D 25/42 (2014.10); G03F 7/001 (2013.01); G03F 7/031 (2013.01); G03F 7/105 (2013.01); G03F 7/2012 (2013.01); G03F 7/2022 (2013.01); G07D 7/003 (2017.05); H01F 41/16 (2013.01); B42D 25/324 (2014.10); B42D 25/425 (2014.10); G03F 7/0012 (2013.01); G06Q 30/0185 (2013.01);
Abstract
The invention relates to the field of the protection of security documents such as for example banknotes and identity documents against counterfeit and illegal reproduction. In particular, the invention relates to processes for producing optical effect layers (OELs) comprising a motif made of at least two areas made of a single hardened layer on a substrate comprising a photomask.