The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2019

Filed:

Aug. 22, 2017
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventor:

Takashi Hagino, Fujimi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/068 (2006.01); H01S 5/183 (2006.01); H03L 7/26 (2006.01); G04F 5/14 (2006.01); H01S 5/32 (2006.01); H01S 5/187 (2006.01); H01S 5/343 (2006.01); H01S 5/022 (2006.01); H01S 5/042 (2006.01);
U.S. Cl.
CPC ...
H01S 5/06821 (2013.01); G04F 5/14 (2013.01); H01S 5/183 (2013.01); H01S 5/18355 (2013.01); H01S 5/3201 (2013.01); H03L 7/26 (2013.01); H01S 5/02276 (2013.01); H01S 5/0425 (2013.01); H01S 5/187 (2013.01); H01S 5/18308 (2013.01); H01S 5/18352 (2013.01); H01S 5/34313 (2013.01); H01S 2301/176 (2013.01);
Abstract

A surface emitting laser includes a substrate, a stacked structure provided on the substrate and including a resonator and a first distortion applier connected to the resonator and applying distortion to the active layer, and a second distortion applier provided on the substrate and applying distortion to the active layer. As seen from a stacking direction, the first distortion applier has a first portion and a second portion provided with the resonator in between, as seen from the stacking direction, a longitudinal direction of the second distortion applier and a longitudinal direction of the first distortion applier are the same direction, and a magnitude relationship of a linear expansion coefficient of the second distortion applier to a linear expansion coefficient of the substrate is the same as a magnitude relationship of a linear expansion coefficient of the first distortion applier to the linear expansion coefficient of the substrate.


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