The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2019

Filed:

Mar. 22, 2018
Applicant:

Ablic Inc., Chiba-shi, Chiba, JP;

Inventor:

Takeshi Koyama, Chiba, JP;

Assignee:

ABLIC INC., Chiba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H01L 31/0216 (2014.01); H01L 27/144 (2006.01); H01L 31/18 (2006.01); H01L 31/103 (2006.01); H01L 31/0352 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02165 (2013.01); H01L 27/1443 (2013.01); H01L 31/02162 (2013.01); H01L 31/035272 (2013.01); H01L 31/103 (2013.01); H01L 31/1804 (2013.01);
Abstract

First and second semiconductor light receiving elements each include: a first P-type semiconductor region which is formed in an N-type semiconductor substrate; a first N-type semiconductor layer region which is formed in the first P-type semiconductor region; a P-type semiconductor region having a high concentration which is formed in the first P-type semiconductor region; and an N-type semiconductor region having a high concentration which is formed in the first N-type semiconductor layer region. On the semiconductor substrate, insulating oxide films are formed. On the first and the second semiconductor light receiving elements, insulating oxide films that have different thicknesses are formed.


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