The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2019

Filed:

Jul. 21, 2015
Applicant:

Flexenable Limited, Cambridge, GB;

Inventors:

Jan Jongman, Cambridgeshire, GB;

Anja Wellner, Dresden, DE;

Jens Dienelt, Radebeul, DE;

Karsten Neumann, Dresden, DE;

Stephan Riedel, Dresden, DE;

Assignee:

FLEXENABLE LIMITED, Cambridge, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 27/32 (2006.01); H01L 51/05 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1054 (2013.01); H01L 27/3237 (2013.01); H01L 27/3248 (2013.01); H01L 27/3258 (2013.01); H01L 27/3262 (2013.01); H01L 27/3272 (2013.01); H01L 27/3274 (2013.01); H01L 51/0533 (2013.01); H01L 51/0014 (2013.01); H01L 51/052 (2013.01);
Abstract

A technique comprising: providing a stack of layers defining at least (a) source and drain electrodes, (b) gate electrode, and (c) semiconductor channel of at least one transistor; depositing one or more organic insulating layers over the stack; removing at least part of the stack in one or more selected regions by an ablation technique; depositing conductor material over the stack in at least the one or more ablated regions and one or more border regions immediately surrounding a respective ablated region; and depositing inorganic insulating material over the stack at least in the ablated regions and the border regions to cover the ablated regions and make direct contact with said conductor material in said one or more border regions all around the respective ablated region.


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