The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2019

Filed:

Jan. 02, 2018
Applicant:

Imec Vzw, Leuven, BE;

Inventors:

Johan Swerts, Kessel-Lo, BE;

Sebastien Couet, Grez-Doiceau, BE;

Assignee:

IMEC vzw, Leuven, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/39 (2006.01); H01F 10/30 (2006.01); H01F 10/13 (2006.01); H01F 10/32 (2006.01); H01F 41/30 (2006.01); H01F 41/32 (2006.01); B82Y 10/00 (2011.01); B82Y 25/00 (2011.01); H01L 27/22 (2006.01);
U.S. Cl.
CPC ...
H01F 10/30 (2013.01); G11B 5/3909 (2013.01); H01F 10/138 (2013.01); H01F 10/3254 (2013.01); H01F 41/302 (2013.01); H01F 41/325 (2013.01); B82Y 10/00 (2013.01); B82Y 25/00 (2013.01); H01L 27/222 (2013.01);
Abstract

The disclosed technology generally relates to a magnetoresistive device and more particularly to a magnetoresistive device comprising chromium. According to an aspect, a method of forming a magnetoresistive device comprises forming a magnetic tunnel junction (MTJ) structure over a substrate. The MTJ structure includes, in a bottom-up direction away from the substrate, a free layer, a tunnel barrier layer and a reference layer. The method additionally includes forming a pinning layer over the MTJ structure, wherein the pinning layer pins a magnetization direction of the reference layer. The method additionally includes forming capping layer comprising chromium (Cr) over the pinning layer. The method further includes annealing the capping layer under a condition sufficient to cause diffusion of Cr from the capping layer into at least the pinning layer. According to another aspect, a magnetoresistive device is formed according to the method.


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