The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
Sep. 08, 2015
Applicant:
Qualcomm Incorporated, San Diego, CA (US);
Inventor:
Regan Blythe Towal, La Jolla, CA (US);
Assignee:
QUALCOMM Incorporated, San Diego, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 15/18 (2006.01); G06N 3/08 (2006.01); G06N 3/04 (2006.01); G06N 7/00 (2006.01);
U.S. Cl.
CPC ...
G06N 3/088 (2013.01); G06N 3/0481 (2013.01); G06N 7/005 (2013.01);
Abstract
A method of biasing a deep neural network includes determining whether an element has an increased probability of being present in an input to the network. The method also includes adjusting a bias of activation functions of neurons in the network to increase sensitivity to the element. In one configuration, the bias is adjusted without adjusting weights of the network. The method further includes adjusting an output of the network based on the biasing.
Quick Actions:
Towal, Regan. (2019). Incorporating top-down information in deep neural networks via the bias term (U.S. Patent No. 10325202). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10325202
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile