The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
May. 06, 2016
Boe Technology Group Co., Ltd., Beijing, CN;
Tailiang Li, Beijing, CN;
Junmin Sun, Beijing, CN;
Hongli Ding, Beijing, CN;
Hongtao Guan, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
Abstract
The present disclosure provides a system for generating a mask pattern, a method for generating a mask pattern, and an exposure system. According to an embodiment of the present disclosure, the system for generating a mask pattern comprises: a mask pattern provision device configured to provide a mask pattern signal via a wired or wireless network; a mask pattern transmission device configured to process the mask pattern signal provided by the mask pattern provision device to generate mask pattern information, and to transmit the generated mask pattern information over a Radio Frequency Identification (RFID) signal; and a mask pattern generation device configured to generate a mask pattern corresponding to the mask pattern information based on the mask pattern information and display the generated mask pattern. The embodiments of the present disclosure allow interaction between the mask pattern provision device and the mask pattern generation device by utilizing IoT technique, such that the mask pattern generation device can display various different mask patterns on an e-ink screen, thereby providing a fast, convenient and low cost exposure scheme.