The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
Oct. 12, 2017
Olympus Corporation, Hachioji-shi, Tokyo, JP;
Hirokazu Konishi, Tokyo, JP;
OLYMPUS CORPORATION, Tokyo, JP;
Abstract
An immersion objective has a numerical aperture of 1.42 or higher, and includes in order from the object side a positive first lens group, a positive second lens group, and a negative third lens group. The first lens group includes a first cemented lens that includes a plano-convex lens and a first meniscus lens, and a positive lens. The second lens group includes a plurality of cemented lenses. The third lens group includes in order from the object side a second cemented lens that includes a positive lens and a negative lens, a negative lens that has a concave surface facing the object side, and a positive lens. When H is a maximum height of an axial marginal ray, f is a focal length of the objective, and NAis the numerical aperture, the objective satisfies a conditional expression below3.5≤()×NA≤5.2  (1).