The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2019

Filed:

Jan. 13, 2016
Applicant:

Giesecke+devrient Currency Technology Gmbh, München, DE;

Inventors:

Christoph Mengel, Holzkirchen, DE;

Peter Franz, Pienzenau/Bruck, DE;

Thanh-Hao Huynh, Bruckmühl, DE;

Karlheinz Mayer, Grünenbach, DE;

Christian Fuhse, Otterfing, DE;

Stefan Bichlmeier, Riemerling, DE;

Matthias Pfeiffer, München, DE;

Christof Baldus, München, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B42D 15/00 (2006.01); B41M 3/14 (2006.01); B42D 25/324 (2014.01); B42D 25/351 (2014.01); B42D 25/355 (2014.01); B42D 25/373 (2014.01); B42D 25/378 (2014.01); B42D 25/425 (2014.01); B41M 1/04 (2006.01); B41M 1/10 (2006.01); B41M 1/12 (2006.01); B42D 25/23 (2014.01); B42D 25/24 (2014.01); B42D 25/29 (2014.01); B42D 25/309 (2014.01); B42D 25/364 (2014.01);
U.S. Cl.
CPC ...
B42D 25/324 (2014.10); B41M 1/04 (2013.01); B41M 1/10 (2013.01); B41M 1/12 (2013.01); B41M 3/148 (2013.01); B42D 25/351 (2014.10); B42D 25/355 (2014.10); B42D 25/373 (2014.10); B42D 25/378 (2014.10); B42D 25/425 (2014.10); B42D 25/23 (2014.10); B42D 25/24 (2014.10); B42D 25/29 (2014.10); B42D 25/309 (2014.10); B42D 25/364 (2014.10);
Abstract

A value and safety document comprises a substrate having a front side and a back side. An ink layer is applied to the front or back sides of the substrate. A first motif is incorporated into the ink layer, and is combined with a second motif. The second motif is arranged on the same side of the substrate as the first motif. The second motif is configured in the form of an emboss structure comprising a plurality of raised emboss elements having areas of different orientation. The emboss structure forms the second motif having a second tilt or motion effect, by different groups of emboss elements, having different characteristic parameters, reflecting incident light in different spatial areas. The emboss elements have respectively a lateral dimension of less than 30 μm and a height of less than 10 μm. The first motif is adapted at least partially to the second motif.


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