The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2019

Filed:

Aug. 10, 2017
Applicant:

The United States of America As Represented BY the Director, National Security Agency, Washingon, DC (US);

Inventor:

Daniel R. Hines, Damascus, MD (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 29/38 (2006.01); B29C 64/393 (2017.01); B33Y 50/02 (2015.01);
U.S. Cl.
CPC ...
B29C 64/393 (2017.08); B33Y 50/02 (2014.12); B41J 29/38 (2013.01);
Abstract

A method is disclosed for calibrating a deposition rate in an aerosol jet printer. The method includes providing a substrate defining an array of wells, each defining a volume. The method also includes defining a toolpath such that a dispensing nozzle passes over the wells. The method also includes defining a dwell time such that the nozzle remains centered above each well for an amount of time equal to the dwell time, after which the nozzle follows the toolpath to be centered over the following well. The dwell time defines a deposition rate based on the volume of the wells. The method also includes causing the nozzle to move along the toolpath, depositing material into the wells. The method also includes observing one of overfilling and underfilling and adjusting dispensing parameters to effect a modified deposition rate, until the wells are being filled to within a tolerance of exactly full.


Find Patent Forward Citations

Loading…