The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
Mar. 10, 2016
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
John F. Stumpf, Phoenix, AZ (US);
Chris Wuester, Chandler, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/50 (2006.01); B01F 5/04 (2006.01); B01F 5/06 (2006.01); H01J 37/32 (2006.01); B01F 5/02 (2006.01); B01F 3/02 (2006.01); B01F 5/00 (2006.01);
U.S. Cl.
CPC ...
B01F 5/0461 (2013.01); B01F 3/02 (2013.01); B01F 5/0268 (2013.01); B01F 5/0451 (2013.01); B01F 5/0651 (2013.01); H01J 37/3244 (2013.01); H01J 37/32357 (2013.01); H01J 37/32449 (2013.01); B01F 2005/0034 (2013.01);
Abstract
A counterflow mixing device for a process chamber is disclosed, comprising an injection tube that introduces a fluid in a manner counter to a flow of a post-plasma gas mixture traveling downward from a plasma source. The invention allows for proper mixing of the fluid as well as avoiding recombination of generated ions and radicals.