Wafer-level manufacturing method for embedding passive element in glass substrate

Abstract

A wafer-level manufacturing method for embedding a passive element in a glass substrate is disclosed. A highly-doped silicon wafer is dry etched to form a highly-doped silicon mold wafer, containing highly-doped silicon passive component structures mold seated in cavity arrays; a glass wafer is anodically bonded to the highly-doped silicon mold wafer in vacuum pressure to seal the cavity arrays; the bonded wafers are heated so that the glass melts and fills gaps in the cavity arrays, annealing and cooling are performed, and a reflowed wafer is formed; the upper glass substrate of the reflowed wafer is grinded and polished to expose the highly-doped silicon passives; the passive component structure mold embedded in the glass substrate is fully etched; the blind holes formed in the glass substrates after the passive component structure mold has been etched is filled with copper by electroplating; the highly-doped silicon substrate and unetched silicon between the cavity arrays are etched, and several glass substrates embedded with a passive element are obtained; to form electrodes for the passives, a metal adhesion layer is deposited, and a metal conductive layer is electroplated. The process is simple, costs are low, and the prepared passive elements have superior performance.