The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2019

Filed:

Oct. 08, 2015
Applicant:

Riken, Saitama, JP;

Inventors:

Ryota Kinjo, Saitama, JP;

Takashi Tanaka, Saitama, JP;

Assignee:

RIKEN, Saitama, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01F 7/00 (2006.01); H05H 7/04 (2006.01); H05H 13/04 (2006.01); G21K 1/00 (2006.01); H01F 7/02 (2006.01); H01F 7/06 (2006.01);
U.S. Cl.
CPC ...
H05H 7/04 (2013.01); G21K 1/003 (2013.01); H01F 7/0278 (2013.01); H01F 7/06 (2013.01); H05H 13/04 (2013.01);
Abstract

In an undulator magnet array, an upper magnet array is formed by coupling an upper shift magnet array and an upper reference magnet array, and a lower magnet array is formed by coupling a lower reference magnet array and lower shift magnet array arranged so as to face the magnet arrays. With reference to a state where the amplitudes of periodic magnetic fields that can be formed by the upper magnet array and the lower magnet array are maximized, the upper shift magnet array is shifted ¼ of a period to the left as seen from the lower reference magnet array and the lower shift magnet array is shifted ¼ of a period to the left as seen from the upper reference magnet array.


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