The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
Sep. 20, 2017
Flir Systems, Inc., Wilsonville, OR (US);
Sam Grigorian, Fresno, CA (US);
Nicholas Högasten, Santa Barbara, CA (US);
Pierre Boulanger, Goleta, CA (US);
FLIR Systems, Inc., Wilsonville, OR (US);
Abstract
A partially attenuating shutter may be used to identify and reduce fixed pattern noise (FPN) associated with imaging devices. In one example, a system includes an image capture component configured to capture images in response to incident radiation from a scene along an optical path. The system includes a shutter configured to attenuate a first portion of the incident radiation and permit a second portion of the incident radiation to pass. The system also includes an actuator configured to translate the shutter between an open position out of the optical path, and a closed position in the optical path between the scene and the image capture component. The system also includes a processor configured to determine a plurality of FPN correction terms using images captured by the image capture component while the shutter is in the open and closed positions. Related systems and methods are also provided.