The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
Apr. 28, 2017
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Michael L. Schmit, Sunnyvale, CA (US);
Radhakrishna Giduthuri, Sunnyvale, CA (US);
Kiriti Nagesh Gowda, Sunnyvale, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method and apparatus of seam finding includes determining an overlap area between a first image and a second image. The first image is captured by a first image capturing device and the second image is captured by a second image capturing device. A plurality of seam paths for stitching the first image with the second image is computed and a cost is computed for each seam path. A seam is selected to stitch the first image to the second image based upon the cost for the seam path for that seam being less than a cost for all other computed seam paths, that seam is maintained as the selected seam for stitching based upon a predefined criteria.