The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2019

Filed:

Aug. 22, 2016
Applicant:

Nichia Corporation, Anan-shi, Tokushima, JP;

Inventor:

Shingo Tanisaka, Komatsushima, JP;

Assignee:

NICHI CORPORATION, Anan-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/022 (2006.01); H01S 5/02 (2006.01); H01S 3/08 (2006.01); H01S 5/20 (2006.01); H01L 21/67 (2006.01); H01S 5/22 (2006.01); G02B 19/00 (2006.01); H01S 5/00 (2006.01);
U.S. Cl.
CPC ...
H01S 5/02252 (2013.01); G02B 19/0052 (2013.01); H01L 21/67075 (2013.01); H01S 3/08059 (2013.01); H01S 5/0201 (2013.01); H01S 5/0203 (2013.01); H01S 5/0206 (2013.01); H01S 5/02296 (2013.01); H01S 5/2081 (2013.01); H01S 5/2201 (2013.01); H01S 5/0071 (2013.01); H01S 5/02212 (2013.01);
Abstract

A method for manufacturing an optical member includes providing a silicon substrate having a first main surface of a {110} plane and a second main surface of a {110} plane that are parallel to each other, forming mask patterns on the first main surface and the second main surface, each of the mask patterns having an opening extending in one direction, so that the opening on a first main surface side and the opening on a second main surface side are disposed alternately, or so that the opening on the second main surface side are disposed directly under the opening on the first main surface side, forming recesses having sloped surfaces in the first main surface side and the second main surface side by wet etching the silicon substrate using the mask patterns as masks, and forming a reflective film on the first main surface or the second main surface.


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